Fabrication of Multilayer Metal-Dielectric Nanofilms for Coupled Plasmon Resonant Devices
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0919-J02-06
Fabrication of Multilayer Metal-Dielectric Nanofilms for Coupled Plasmon Resonant Devices M. Joseph Roberts, Andrew Guenthner, Geoff Lindsay, and Simin Feng NAVAIR NAWCWD, China Lake, 93555 ABSTRACT We have developed a process for production of laterally continuous silver layers alternated with glassy polymer films in which the thickness is on the order of 15 nm and 100 nm respectively. Such films can be used to study physical phenomena associated with the coupled plasmon resonance [1] and the resonant transmission in the forbidden bands [2]. Such films may also find applications in photonic bandgap and other nanoplasmonic devices. Since the surface plasmon and evanescent coupling is a means to propagate light inside nanocircuits, the investigation of the coupled surface plasmon in the multilayer structures provides us with fundamental knowledge for the 3D integration. The fabrication technique also allows design flexibility, for example, systems with regions of single M-D-M plane together with multilayer structures facilitating tunable multiple plasmon resonance wavelength response from a single system. Multiple plasmon wavelength resonance absorptions may be obtained from such systems. Utilizing polymer films as the dielectric enables design flexibility and increases the number of applications of the fabricated devices. INTRODUCTION For this report, we undertook the task of experimental verification of the recent theoretical work of Feng, et al [3] that described non-diffraction propagation inside metallodielectric (MD) nanofilm structures. Photonic bands can not only control transmission frequency of light, but also deeply affect wave diffraction. Through photonic engineering, non-diffraction propagation can be achieved in multilayer metallodielectric structures, leading to high resolution imaging of an emissive pattern. For our work, this presents two main technical challenges; the fabrication of the emissive nanopatterns with metal-dielectric layers, and second, the characterization of the emissive nanopatterns using collection mode near-field scanning optical microscopy (NSOM). In the classic work of Zhang, et al, superlens effect was demonstrated by exposing a resist through a single layer of Ag [4]. More recently, Blaikie has demonstrated nearfield exposure of a resist through two layers of Ag [5]. In those experiments, they demonstrated sub-wavelength imaging through recovery of evanescent components. In our current work, we demonstrate a different effect related to the image resolution, i.e., suppressing diffraction of propagation components to achieve higher resolution image. It is well known that wave diffraction can blur image resolution upon propagation, thus by suppressing diffraction higher resolution image can be achieved. Since the size of object in our experiment is on the order of wavelength, a convenient way of imaging is to use collection mode NSOM to directly map the light intensity distribution in the vicinity of a metal-dielectric stacks.
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