Pulse current generator with improved waveform fidelity for high-voltage capacitively coupled plasma systems
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ORIGINAL ARTICLE
Pulse current generator with improved waveform fidelity for high‑voltage capacitively coupled plasma systems Beomseok Chae1 · Juhwa Min1 · Yongsug Suh1 · Hyejin Kim2 · Hyunbae Kim2 Received: 25 March 2020 / Revised: 28 May 2020 / Accepted: 1 June 2020 © The Korean Institute of Power Electronics 2020
Abstract This paper proposes a current source-type pulse generator circuit to improve load voltage waveforms by solving the voltage ringing problem of capacitively coupled plasma systems. The voltage source-type pulse power supplies used in the plasma industry have short-circuit currents and voltage ringing problems with capacitively coupled plasma loads. The current source-type pulse generator proposed in this paper can solve these problems. The proposed circuit consists of four detailed circuits: bias current generator, bias current modulator, slope current generator, and slope current modulator. They form two constant currents at the DC link, and output two pulse currents to the load. These output currents contribute to generating the plasma load voltage required by the capacitively coupled plasma process. The proposed circuit is verified by a PLECS simulator and a laboratory-scale hardware system. To check the improvement of the output waveform, a voltage source-type pulse generator and the current source-type pulse generator are tested under the same experimental conditions. The results are represented by load voltage and current waveforms. In addition, the entire system of the current source-type pulse generator is designed and verified by simulation and experimental results. The resulting output waveforms meet the process requirements, and the obtained results demonstrate that the proposed current source-type pulse generator circuit can be suitably used for capacitively coupled plasma loads. Keywords Capacitively coupled plasma · Current source converter · Pulse power generator · Plasma power supply · Plasma applications
1 Introduction Recently, power electronics technologies have been introduced into the plasma application industry. Typically, various power converters and control techniques are applied to RF generators and pulse power supply systems using the latest power semiconductor devices [1, 2]. When compared to conventional practices, plasma systems employing power electronic technologies have a number of benefits such as improved efficiency, reduced volume and increased energy density. The pulsed power supplies used in semiconductor etching and deposition processes generally require high-performance power supplies that achieve a voltage of several kV * Yongsug Suh [email protected] 1
Department of Electrical Engineering, Jeonbuk National University, Jeonju, Korea
Manufacturing Technology Center, Samsung Electronics, Hwaseong, Korea
2
and a current rise/fall time of less than 100 ns [3]. In developing such high-performance pulse power supply devices, switching mode power supply devices are more advantageous than the conventional linear amplifier power supply devices when it co
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