Titanium Oxide Films Prepared by Cathodic Electrodeposition Method
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https://doi.org/10.1007/s11664-020-08513-z Ó 2020 The Minerals, Metals & Materials Society
Titanium Oxide Films Prepared by Cathodic Electrodeposition Method YING TAO1,3 and BAOJUN ZHU2 1.—School of Materials Science and Engineering, Central South University, Changsha 410083, Hunan, China. 2.—School of Materials Science and Engineering, Hunan University, Changsha 410082, Hunan, China. 3.—e-mail: [email protected]
In this paper, titanium oxide (TiO2) films were prepared by cathodic electrodeposition using titanium oxysulfate (TiOSO4), potassium nitrate (KNO3), citric acid, and hydrogen peroxide (H2O2) as reactants. The article investigated the effect of citric acid and deposition temperature on the structure and electrochemical properties of TiO2 films. The results indicated that hydrous TiO2 thin films were prepared at 60°C when no citric acid was added, while thin films containing hydrous TiO2 and anatase phase were fabricated at 60– 75°C when citric acid was added. It was found that adding citric acid and raising the reaction temperature (60–75°C) were beneficial to reduce crack width until cracks disappeared. Adding citric acid facilitated phase transition from hydrous TiO2 to anatase. Continuous and uniform TiO2 thin film was prepared at 75°C, which was found to have ideal capacitive behavior with a rectangular cyclic voltammogram and high photocurrent performance with photocurrent 2.89 lA, which is several times higher than that of cracked samples. Key words: Titanium oxide, anatase, cathodic deposition method, electrochemical analysis
INTRODUCTION TiO2 thin films are used in a variety of applications in environmental and energy field, such as photocatalysts, dye-sensitized solar cells (DSSCs), lithium-ion batteries, supercapacitors and electrochromic devices.1–5 Nanostructured TiO2 films are generally prepared by high-temperature methods such as physical vapor deposition (PVD), chemical vapor deposition (CVD) and sol–gel processes.4–7 TiO2 films are also grown on conducting glass or metallic electrodes using electrodeposition, which is usually carried out in an aqueous solution containing titanium compounds such as TiCl3, TiCl4, TiOSO4 and (NH4)2[TiO(C2O4)2]. Electrodeposition is a simple, low cost and
(Received June 18, 2020; accepted September 22, 2020)
environmentally friendly route to achieve facile control of TiO2 films.8–11 In the article, TiO2 films were prepared on tantalum (Ta) substrates by cathodic electrodeposited at 60–75°C from an aqueous solution of TiOSO4, H2O2, KNO3 and citric acid (or not adding citric acid). The citric acid and deposition temperature were found to be important factors to affect the structure and properties of films. EXPERIMENTAL One gram of TiOSO4, 0.8 g KNO3, and 0.2 g citric acid or citric acid free were dissolved in 50 ml distilled water and stirred at 50°C to form a colorless solution. After adding 5 ml of 10 vol.% H2O2, the color of the solution changed from colorless to dark reddish. Detailed description of electrodeposition of TiO2 thin film on ITO substrate was d
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