Upcoming Conferences

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Fourth BACG Photochemical Processing Workshop to be Held at University College London The Fourth Photochemical Processing Workshop of the British Association for Crystal Growth (BACG) will be held April 21,1989 at University College London. As in previous years the workshop aims to cover photochemical processes of present or potential application in semiconductor device fabrication. Papers are welcomed on the techniques of light-induced metallization, insulator deposition, etching, photo-ablation, epitaxial deposition, and related assessment; and on other novel areas involving the direct interaction of light with gases, liquids or solids to produce or modify surface studies. The workshop's host at University College London (UCL) will be Ian W. Boyd. UCL is an established and expanding center for laser processing, with studies of fun-

damental mechanisms and macroscopic applications under the direction of Ian Boyd and Richard B. Jackman. UCL is also part of the University of London Interdisciplinary Research Centre in Semiconductor Materials. For information contact: J. Haigh, British Telecom Research Laboratories, Martlesham Heath, Ipswich IP5 7RE, Suffolk, United Kingdom; or I.W. Boyd, Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom; telephone (01) 387-7050; fax (01) 387-4350.

49th Annual Conference on Physical Electronics Scheduled for June The Forty-Ninth Annual Conference on Physical Electronics will be held at Kane Hall, University of Washington, Seattle, Washington, June 19-21,1989. This annual conference is sponsored by the American

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Physical Society's Division of Condensed Matter Physics and Division of Atomic, Molecular, and Optical Physics. The conference continues a tradition of presenting new research results with ample time for discussion (15-minute presentation followed by a 5-minute discussion). Both experimental and theoretical oral presentations will cover the fundamental physics and chemistry of solid surfaces and interfaces. Topics include electronic, chemical, and crystallographic properties of surfaces and interfaces, as well as kinetic and dynamic mechanisms of physical and chemical reactions, phase transitions, and adsorption. The properties of surfaces that are clean or that incorporate foreign atoms are of interest, as are papers which present new methods of surface analysis and characterization. The conference, however, will continue to emphasize the description of surface and interface properties at a fundamental atomic and molecular level. Abstracts in the proper