Aluminum-Based Metallurgy for Global Interconnects
- PDF / 3,318,125 Bytes
- 4 Pages / 576 x 777.6 pts Page_size
- 40 Downloads / 157 Views
the interaction between the various components of this system can affect the performance of the interconnect. For example, the intermetal dielectric changes the mechanical stress in the interconnect;1 the presence of W plugs in vias can affect the electromigration resistance of interconnects.2 In this article, we will examine the problems that are encountered when using Al alloys as a global interconnect and illustrate how the material properties can be modified to solve these problems.
Requirements for Global Interconnects A metallization system used for global interconnects has to satisfy the following minimum conditions (many of the electrical values listed here are the upper
Passivation I Metal 2 int e rm e t
Data Loading...
