Dual Function Polyvinyl Alcohol Based Oxide Precursors for Nanoimprinting and Electron Beam Lithography
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Dual Function Polyvinyl AlcoholBasedOxidePrecursorsforNanoimprinting and Electron Beam Lithography J. Malowney1,2, N. Mestres1, X. Borrise2,3, A. Calleja1, R. Guzman1, J. Llobet2, J. Arbiol1,4, T. Puig1, X. Obradors1 and J. Bausells2 1 Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain 2 Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain 3 Catalan Nanotechnology Institute (ICN), Bellaterra, 08193, Spain 4 Catalan Institution for Research and Advanced Studies (ICREA), Barcelona, 08010, Spain ABSTRACT Ordered arrays of crystalline complex oxides nanostructures were synthesized onto single crystal insulating substrates using aqueous polyvinyl alcohol based electron beam resist precursors. The irradiated zones are insoluble in water (negative-tone resist) due to the electron induced cross linking of polyvinyl alcohol. The subsequent high temperature treatment of the developed precursor samples leads to the formation of ordered arrays of nanodots for low irradiation doses. For high irradiation dosages, epitaxially and oriented nanowires are obtained. These same precursors were shown to be nanoimprintable on single crystal substrates. This allows for future dual processing of a single precursor film gaining nano-structuration from both electron beam and nanoimprint lithography methods. INTRODUCTION In the last years, investigations concerning functional oxide nanostructures have received a great deal of attention for the development of future technologies like magnetic memories or new types of sensors and logic devices [1,2], because nanoscale complex oxides can display different and improved magnetic, electrical, optical and mechanical properties compared to their bulk counterparts. Since many functional properties rely on epitaxial order and crystal orientation (e.g., piezoelectric and high-TC superconducting properties), growth methods that are able to provide ordered arrays of epitaxial nanostructures are highly interesting. Several recent studies in our group have grown epitaxial single crystalline functional oxide nanostructures on single crystal substrates [3-5]. However, these nanostructures were generated with no precise position control. Through the use of lithography, nanostructures may be written in arrays and other configurations. La0.7Sr0.3MnO3 (LSMO) was the functional complex oxide we focused in this work due to its interesting physical properties. It has a Curie temperature of 360 K, the ability to change electrical resistance dramatically under applied magnetic field, half metallicity for spin conduction, a highly anisotropic magnetic nature, and the ability to alter its physical properties when strained [6,7]. Chemical solution growth methods based on an aqueous solution laden with soluble metal salts is thought to be an inexpensive and easily scalable growth approach. Our aim was to combine a polyvinyl alcohol (PVOH) based electron sensitive precursor resist with electron beam lithography to obtain epitaxial LSMO patterns with sub-micro
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