Materials for Multiphoton 3D Microfabrication
- PDF / 397,422 Bytes
- 5 Pages / 585 x 783 pts Page_size
- 6 Downloads / 198 Views
Multiphoton 3D Microfabrication
Seth R. Marder, Jean-Luc Brédas, and Joseph W. Perry Abstract Two-photon/multiphoton lithography (MPL) has emerged as a versatile technique for the fabrication of complex 3D polymeric, hybrid organic/inorganic, and metallic structures. This article reviews some recent advances in the development of molecules and materials that enable two-photon and multiphoton 3D micro- and nanofabrication. Materials that exhibit high sensitivity for the generation of reactive intermediates are described, as are various materials systems that enable functional devices to be made and in some cases enable structures to be replicated. The combination of advances illustrates the opportunities for MPL to have a significant impact in the areas of photonics, microelectromechanical systems, and biomedical technologies.
Introduction There is a growing interest in the fabrication of truly three-dimensional microstructures and devices for potential applications in photonics, microelectromechanical systems, microfluidics, and tissue engineering, among other fields.1–3 In 2D lithography, major advances have been made in decreasing the feature sizes in devices. For example, lithographic processes for making complex integrated circuits with 65-nm features are now used in the commercial production of microprocessors,4 but these processes are restricted to 2D patterning in a given exposure step. Progress also has been made in using molecular, nanotube, and nanoparticle self-assembly to build structures with unique properties in a bottomup approach.5–7 Such self-assembly processes, however, are limited predominantly to the formation of periodic structures. Fabrication of 3D objects of arbitrary shapes with feature sizes approaching those achievable by either photon or electron-beam lithography traditionally has been an extremely difficult task. Some types of 3D structures can be fabricated using sequential layer-by-layer lithographic processes,8 direct-writing with inks,9 stereolithography,10 and multibeam interference lithography,11 which
have limitations in terms of being quite restricted in the range or the spatial resolution of 3D structures that can be formed, or are consuming in terms of the number of masks and amounts of solvent required. Many new or emerging technologies demand fabrication of 3D structures with submicron feature sizes and great flexibility in shape and material composition. Two-photon/multiphoton lithography (MPL) offers the potential for micro- and nanofabrication of arbitrary 3D structures in a single coat/expose/ develop process cycle. In this article, we review the development of two-photon absorbing materials that can be used for 3D microfabrication of a variety of complex structures.
Two-Photon/Multiphoton Lithography Two-photon absorption (2PA) provides a means of activating chemical or physical processes with high spatial resolution in three dimensions and feature widths as small as ~100 nm. With sufficiently intense light, such as from a pulsed laser beam, it is possible for a mol
Data Loading...
