Chemical Mechanical Surface Nano-Structuring (CMNS) Implementation on Titanium Based Implants to Enhance Corrosion Resis
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MRS Advances © 2020 Materials Research Society DOI: 10.1557/adv.2020.325
Chemical Mechanical Surface NanoStructuring (CMNS) Implementation on Titanium Based Implants to Enhance Corrosion Resistance and Control Biocompatibility Kimberly Beers, Debashish Sur, G. Bahar Basim Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611
ABSTRACT
Titanium is the metal of choice for many implantable devices including dental prostheses, orthopaedic devices and cardiac pacemakers. Titanium and its alloys are favoured for hard tissue replacement because of their high strength to density ratio providing excellent mechanical properties and biocompatible surface characteristics promoting in-vivo passivation due to spontaneous formation of a native protective oxide layer in the presence of an oxidizer. This study focuses on the development of a three-dimensional chemical, mechanical, surface nano-structuring (CMNS) process to induce smoothness or controlled nano-roughness on the bio-implant surfaces, particularly for applications in dental implants. CMNS is an extension of the chemical mechanical polishing (CMP) process. CMP is utilized in microelectronics manufacturing for planarizing the wafer surfaces to enable photolithography and multilayer metallization. In biomaterials applications, the same approach can be utilized to induce controlled surface nanostructure on three-dimensional implantable objects to promote or demote cell attachment. As a synergistic method of nano-structuring on the implant surfaces, CMNS also makes the titanium surface more adaptable for the bio-compatible coatings as well as the cell and tissue growth as demonstrated by the electrochemical and surface wettability evaluations on implants prepared by DI-water machining versus oil based machining.
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INTRODUCTION Nano-scale modification of macro-scale three-dimensional implantable devices is gaining more attention as the cell attachment/detachment mechanisms at the biointerfaces are profoundly affected by the nanoscale interfacial interactions [1]. It has been shown that the chemical mechanical polishing (CMP) approach that is primarily utilized in microelectronics manufacturing can be extended to induce controlled surface nanostructure on three-dimensional implants to promote or demote cell attachment [2]. By tuning the polishing slurry particle size, solids loading and the chemical composition, both the chemical nature and the surface topography can be modified to make the surface very smooth or rough at nanoscale. This new technique helps produce implant surfaces that are cleaned from potentially contaminated surface layers by removing a nano-scale top layer while simultaneously creating a protective oxide film on the surface to limit any further contamination to minimize risk of
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