State-of-the-Art Evaluation of Ultra-Clean Ulsi Processes
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'Hewlett-Packard Labs, Bldg. 26, 3500 Deer Creek Rd., Palo Alto, CA 94304 2 Stanford Synchrotron Radiation Lab, SLAC MS 69. PO Box 4349, Stanford, CA 94309 3Toshiba Corp., Kawasaki, JAPAN 4 Applied Materials, 350 Bowers Ave., Santa Clara, CA 95051 5 Kevex, Inc., 855 Veterans Blvd., San Carlos, CA 94070 6 Kevex, Inc., 24911 Avenue Stanford, Valencia, CA 91355
ABSTRACT This work describes recent progress in implementation and applications of synchrotron radiation total reflection x-ray fluorescence (SR-TXRF) to measure trace metals on wafer surfaces. To date, we have achieved state-of-the-art transition metal sensitivity of 3x10 8 atoms/cm 2 (-3fg) for 1000 sec. counting time for impurities which have an monolayer-like distribution on the surface and
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