Supersmooth and modified surface of sapphire crystals: Formation, characterization, and applications in nanotechnologies
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Supersmooth and Modified Surface of Sapphire Crystals: Formation, Characterization, and Applications in Nanotechnologies A. E. Muslimova,*, V. E. Asadchikova, A. V. Butashina, V. P. Vlasova, A. N. Deryabina, B. S. Roshchina, S. N. Sulyanova,b, and V. M. Kanevskya a Shubnikov
Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,” Russian Academy of Sciences, Leninskii pr. 59, Moscow, 119333 Russia b National Research Centre “Kurchatov Institute”, pl. Akademika Kurchatova 1, Moscow, 123182 Russia *e-mail: [email protected] Received May 10, 2016
Abstract—The results of studying the state of the surface of sapphire crystals by a complex of methods in different stages of crystal treatment are considered by an example of preparing sapphire substrates with a supersmooth surface. The possibility of purposefully forming regular micro- and nanoreliefs and thin transition layers using thermal and thermochemical impacts are considered. The advantages of sapphire substrates with a modified surface for forming heteroepitaxial CdTe and ZnO semiconductor films and ordered ensembles of gold nanoparticles are described. The results of the experiments on the application of crystalline sapphire as a material for X-ray optical elements are reported. These elements include total external reflection mirrors and substrates for multilayer mirrors, output windows for synchrotron radiation, and monochromators working in the reflection geometry in X-ray spectrometers. In the latter case, the problems of the defect structure of bulk crystals sapphire and the choice of a method for growing sapphire crystals of the highest structural quality are considered. DOI: 10.1134/S106377451605014X
CONTENTS Introduction 1. Surface Roughness and Atomically Smooth Steps 2. Heteroepitaxy of АIIBVI Compounds on Sapphire 3. Gold Films on Sapphire 4. Micro- and Nanostructured Sapphire Surface: Oxidation of Al Films 5. Sapphire As a Material for X-Ray Optical Elements Conclusions INTRODUCTION Currently, single-crystal sapphire (α-Al2O3) is widely used in industry as a material for substrates, windows, laser and dispersion elements, crucibles, etc. Sapphire substrates are used, in particular, to grow epitaxial Si (silicon-on-saphire (SOS) structures), GaN, InN, AlN, and GaP layers for integrated circuits; blue, green, and white light-emitting diodes (LEDs); laser diodes; and RF transistors [1]. Sapphire windows are also used in furnaces, vacuum systems, fire-alarm systems, deep-water chambers, and aviation technology [2, 3] (i.e., in the fields where devices
must operate under extreme conditions), as well as in watches. Sapphire tubes and crucibles are applied in commercial and laboratory equipment to carry out physical and chemical processes in corrosive media and vacuum, at high temperatures, etc. The role of single-crystal sapphire as a laser material is also very important: the first laser was developed using an artificial ruby crystal, i.e., a sapphire crystal containing impurity Cr3+ ions as an active element
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