Unconventional Approaches for Advanced Nanotechnology
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0901-Rb09-01.1
Unconventional Approaches for Advanced Nanotechnology Kyung M. Choi, Kenneth J. Shea, and John A. Rogers Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey, 07974, U.S.A.; Department of Materials Science and Engineering, University of Illinois, Urbana, IL 61801,U.S.A.;Department of Chemistry, University of California, Irvine, CA 92697, U.S.A.
Since chemists and materials scientists have been seeking for unconventional routes to synthesize and fabricate novel patterns for applied nanotechnology, we introduced useful functional polymers, which can be patternable on a variety of substrates to fabricate devices with specific functions. We introduce new silicon elastomeric polymers as a stamp material for high fidelity in nano-scale soft lithography. We also fabricated elastic photopatterns by synthesizing photocurable PDMS prepolymers. Photopatternable polymers with specific molecular recognition functions were also employed to fabricate functional patterns with specific functions for our diverse applications. INTRODUCTION Since industry has sought for new advances in nanotechnology, we are interested in the development of new materials and novel fabrication techniques to meet our growing demands in miniaturization.1-9 This paper presents fundamental challenges in nanotechnology by developing a number of functional polymers to pursue promising technology since nanotechnology is a part of chemical domain. New chemical approaches are demonstrated here by developing designing useful functional polymers to extend current technology to an advanced level for our needs in diverse applications. There are many new developments in this area such as soft lithography, nanofabrications, functional patterning, and microfluidic synthesis to bring innovations in practical applications. However, many cases are using commercial materials, which were produced for other purposes and thus often show the limitations for our specific purposes. We thus present chemical approaches to overcome the limitations and thus to achieve improved performances in this technology by developing new materials or exploring unconventional approaches. Soft lithography has been widely used to transfer small patterns from the masters onto a variety of substrates for fabricating small devices. Silicon elastomers are used for stamping or printing process for pattern transfers. Sylgard 184 from Dow Corning is the most commonly used silicon elastomers on lithographic purposes. However, those commercial silicon rubbers often shows mechanical failures such as collapse, mergence, disconnection, sidewall, and sagging, especially at sub-micron feature sizes with high aspect ratios due to its low compressibility. For this reason, there are limitations for fabricating nano-scale devices using those commercial PDMS stamps. To overcome the limitation, we introduce here a new version of functional stamp materials, which produce not only nano-scale lithography but additional advantages such as an elastomeric photopatternability.
0901-Rb09-01.2
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