1994 E-MRS Spring Meeting Highlights Topical Symposia
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1994 E-MRS Spring Meeting Highlights Topical Symposia Under the auspices of the International Union of Materials Research Societies (IUMRS), the 1994 E-MRS Spring Meeting was held May 24-27, 1994 in the Council of Europe/European parliament building in Strasbourg, France. The agenda comprised a plenary session, an equipment exhibit, the First European Materials Research Society Workshop on Advanced Materials Education, a session on New Materials for the Conservation of Cultural Heritage, and six parallel symposia on such topics as photorefractive materials, polymer surfaces, high-temperature electronics, and porous silicon. The following summaries are highlights of five of the 1994 E-MRS Spring Meeting symposia. For further information, contact: Paul Siffert, E-MRS Secretary, BP 20, 67037 Strasbourg, Cedex 2, France; phone: 33-88-28-65-43; fax: 33-88-28-62-93. Photon-Assisted Processing of Surfaces and Thin Films (Symposium B) Chairs: U.K.P. Biermann, Philips Research Labs, Eindhoven, The Netherlands; J. Dieleman, DSA Consultants, Waalre, The Netherlands; P. Hess, Ruprecht-Karls University, Heidelberg, Germany.
This symposium offered a rich diversity of subjects, providing a comprehensive survey of the field. Many papers dealt with the application of photon/laserassisted processes to the deposition, modification, and etching of surfaces and thin films of a wide variety of materials, and with the characterization of the resulting films and structures. Several areas—laser ablation, in particular—were emphasized, with papers centering around the following topics: • The use of advanced diagnostic techniques, especially modeling, to characterize the processes and understand the physics and chemistry involved. • The advantages of photon-assisted processes over currently established techniques (for example, photon-assisted methods showing fast local treatment with high resolution and reduced substrate temperatures, allowing complicated structures to be obtained with unusual material combinations). • Two striking trends in the laser ablation area—the use of laser beams with improved intensity homogeneity, and the predeposition surface treatment of surfaces—that are essential to improving our understanding of laser ablation and its application in high-quality manufactur-
ing. Improved laser beam quality is also important for other photon-assisted processes. • The application of optical techniques to the in situ control of growth, modification, and etching processes. Many papers dealt with this method for improving processing. • Other applications, including: the finetuned production of multilayers with exciting physical properties, the fabrication of three-dimensional microobjects, rapid prototyping, laser-induced forward transfer for patterning, the production of permanently electrically conducting polymer wires, large-area uv-lamp-assisted deposition and annealing of oxides and dielectrics, laser recrystallization, and doping for the preparation of poly-Si and poly-Si-Ge thin films. Photorefractive Materials: Growth and
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