Physcial characterization of ultrathin high k dielectrics

  • PDF / 447,978 Bytes
  • 11 Pages / 612 x 792 pts (letter) Page_size
  • 0 Downloads / 240 Views

DOWNLOAD

REPORT

N2.2.1

Physcial characterization of ultrathin high k dielectrics W.Vandervorsta,b, B.Brijs, H.Bender, O.T.Conard, J.Petry, O.Richard, S.Van Elshocht, A.Delabie, M.Caymax, S.De Gendt IMEC Kapeldreef 75, B-3001 Leuven, Belgium b also : INSYS, KULeuven, Belgium

ABSTRACT Targeting very thin equivalent oxides (

Data Loading...

Recommend Documents
Scaling of Hafnium-Based High-k Dielectrics

186 23 1MB

Characterization of High-k Dielectrics by Combined Spectroscopic Ellipsometry (SE) and X-Ray Reflectometry (XRR)

189 44 212KB

Stability of Nitrogen and Hydrogen in High-k Dielectrics

160 43 639KB

The Benefits of High- K dielectrics for Polymer TFTs

164 18 130KB

Analysis of Ultra Short MOSFETs with High-k Gate Dielectrics

198 21 27MB

Preparation and Characterization of High Porosity Si0 2 Xerogels for Low k Dielectrics

154 60 645KB

Band Alignments of High-K Dielectrics on Si and Pt

177 102 883KB

High-k dielectrics for hybrid floating gate memory applications

190 74 363KB

Limiting Native Oxide Regrowth for High-k Gate Dielectrics

215 19 97KB

Materials and Physical Properties of Novel High-k and Medium-k Gate Dielectrics

148 88 777KB

Precise characterization of ultrathin nitride/oxide gate dielectrics by grazing x-ray reflectance and spectroscopic elli

178 114 2MB

High Mobility ZnO thin film transistors using the novel deposition of high-k dielectrics

170 55 271KB